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Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid

Shenzhen HongJie Water Technology Co., Ltd.
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    Buy cheap Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid from wholesalers
     
    Buy cheap Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid from wholesalers
    • Buy cheap Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid from wholesalers
    • Buy cheap Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid from wholesalers

    Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid

    Ask Lasest Price
    Brand Name : HongJie
    Certification : ISO 14001,ISO 9001,CE,EPA
    Price : US$66200~US$66500
    Payment Terms : L/C,D/P,T/T,Western Union
    Supply Ability : >300sets/month
    Delivery Time : 1-7working days(depand on raw materials stocking)
    • Product Details
    • Company Profile

    Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid

    I.Overview
    Ultra-pure water is an indispensable core component in chemical mechanical polishing (CMP) polishing solutions, with its purity directly determining the performance of the polishing solution and chip yield. In semiconductor manufacturing, CMP polishing solutions must meet nanometer-level planarization requirements, and ultra-pure water plays a critical role and meets stringent technical requirements in this application.
    In CMP polishing solutions, ultra-pure water is not only a solvent but also an active component that determines polishing uniformity, defect rates, and chip reliability. An ultra-pure water system compliant with the SEMI F63-1109 standard is the cornerstone for achieving a yield rate exceeding 95% in advanced processes (7nm and below).


    II.Standard Process
    Municipal Tap Water → Pretreatment (Multi - media Filtration) → Activated Carbon Adsorption (Residual Chlorine Removal) → Two - stage RO → EDI (Electrodeionization) Continuous Deionization → Mixed Bed Polishing → 185/254nm UV→ 0.05μm Ultrafiltration → Degassing Membrane → Nitrogen - Sealed Storage Tank → 316L Stainless Steel Piping → CMP Slurry Production Line


    III.Parameters

    ParametersRequirements
    Resistivity≥18.2 MΩ·cm (25°C)
    TOC≤1 ppb
    Particles≤5 particles/mL (≥0.05μm)
    Dissolved Oxygen≤10 ppb
    Metal IonsNa⁺/K⁺ < 0.01 ppb
    Fe/Cu/Al < 0.005 ppb
    AnionsCl⁻/SO₄²⁻ < 0.02 ppb
    Microorganisms< 0.1 CFU/mL


    IV.The core functions of ultrapure water in CMP polishing fluid
    Solvent carrier
    Reaction medium
    Contaminant control


    V.Here is a guideline for you to get a proper quotation
    Tell us the raw water/source of water(tap water, well water, or sea water, etc)
    Provide water analysis report(TDS , conductivity, or resistivity, etc)
    Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
    What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )


    Quality Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid for sale
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